Polycrystalline Silicon Wafer
  • Polycrystalline Silicon Wafer

Polycrystalline Silicon Wafer

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  • Introduction
  • Feature
  • Parameters
  • Application scope
CETC48 has a solar wafer capacity of 400MW. The production line is built with self-developed saw machine. By employing diamond wire cutting process, the productivity is improved and the cost is largely reduced. With self-developed high efficiency polycrystalline manufacturing technology, the solar wafer is optimized in micro structure, and its dislocation, stacking fault and other crystal defects have been effectively controlled. Therefore, it can achieve a lower carbon, oxygen and metal impurity concentration, longer minority carrier lifetime and more uniform doping distribution. 详情
  • Conductivity type

    P

    Dimension

    156×156±0.5mm

    Diagonal length

    219±0.5mm

    Chamfer size

    1.5 ± 0.5mm

    Thickness

    200±20μm

    Angle between adjacent sides

    90°±0.1°

    Resistivity

    1.0–3.0Ω·cm

    Minority carrier lifetime

    ≥1.5μs

    Oxygen concentration

    <8×1017 atoms/cm3

    Carbon concentration

    <5×1017 atoms/cm3

    Metal impurity concentration

    Fe, Cr, Ni, Cu, Zn

    TMI: ≤1x10-6 ppmw

    Boron concentration

    ≤0.30ppmw

  • 特点
  • 参数
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