CETC Silicon Carbide (SiC) Process Equipment
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Scanning magnetron sputtering system
Automatic loading and unloading
High capacity
One key fully automatic process
High target utilization (40%)
High capacity
One key fully automatic process
High target utilization (40%)
- Introduction
- Feature
- Parameters
- Application scope
Magnetron sputtering equipment is a multi-functional, high efficiency coating equipment.Thin films of metal, nonmetal, oxide, medium and other materials can be sputtered on substrates such as ceramics, glass, quartz, silicon wafer, etc., such as Au, Al, NiCr, TiW, Si, Al2O3, Si3N4, ZnO, ITO, etc.The spray coating is uniform, compact and has strong adhesion. It can be applied to the preparation of new electronic materials, optics, solar energy, semiconductor and other fields.
- The chamber has a double chamber structure, the work plate is loaded in the feeding chamber, and the film is formed by scanning movement sputtering in the sputtering chamber;
The feeding chamber is pre vacuumized to ensure a good vacuum environment for continuous production;
It has many sputtering targets, and can deposit single-layer, multi-layer, alloy and doped films;
The sputtering targets are isolated with special structure to avoid cross contamination;
Equipped with baking and cleaning functions;
The user has multi-level operation authority, one key automatic process operation, and historical data can be queried. 
- -Target size: (300mm-500mm) × 76mm
-Number of targets: 1-4 - substrate size: 200mm × 200mm ～ 400mm × 400mm
-Scanning speed of workpiece disk: 50mm / S ~ 200mm / s, continuously adjustable
-Substrate table heating: room temperature - 400 ℃, temperature control accuracy ± 1%
-Nonuniformity of membrane deposition: ± 3% ～ ± 5%
-Vacuum system: molecular pump system / cryopump system 
- Various kinds of metal, nonmetal, compound and other thin film materials are plated on the surface of flat substrate.Such as Al, Cu, Au, Pt, Ti, Ni, W, NiCr, TiW, SiO2, Al2O3, TiO2, ZnO, Tan, ITO and other thin films.Suitable for mass production.
ADVISORY MESSAGEA
