CETC Silicon Carbide (SiC) Process Equipment

CETC Silicon Carbide (SiC) Process Equipment

  • Laser welding machine

    Laser welding machine

    Thelaserweldingmachineusesthehigh-energylaserbeamtoheatthematerialinasmallarea.Theenergyradiatedbythelaserbeamdiffusesthroughtheheattransfertoguidetheinternald..

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  • Chain sintering furnace

    Chain sintering furnace

    Chainsinteringfurnaceisakindofcontinuoussinteringfurnacewithcontrollablemultitemperaturezone,whichcanbeusedforCOfiringandpostfiringoflow-temperatureceramicmate..

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  • Hot press sintering furnace

    Hot press sintering furnace

    ThelowtemperaturehotpressingsinteringfurnaceisusedfordischargingglueandsinteringofLTCCsubstrate.TheshrinkageofLTCCsubstrateiscontrolledbypressureassistedsinter..

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  • Box type sintering furnace

    Box type sintering furnace

    Theboxtypesinteringfurnaceisakindofcontrolledatmosphereliftingtypebatchfurnace.Itcanbeusedfortheprocessingoflaminatingandhotcutting(LTCClowtemperaturecoShaocer..

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  • Vertical high temperature sintering furnace

    Vertical high temperature sintering furnace

    Theverticaltungstenmeshsinteringfurnaceisahigh-temperaturesinteringequipmentforthemanufactureofHTCC,AlNandotherhigh-performanceceramicsubstrates,anditcanalsobe..

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  • Rotary ion beam etching machine

    Rotary ion beam etching machine

    Ionbeametchingisbasedonthesputteringprinciple,usingtheionbeamfromtheionsourcetodirectlybombardtheworkpiece,sputteringoutsomematerialsontheworkpiecethatarenotco..

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  • Scanning ion beam etching machine

    Scanning ion beam etching machine

    Ionbeametchingisbasedonthesputteringprinciple,usingtheionbeamfromtheionsourcetodirectlybombardtheworkpiece,sputteringoutsomematerialsontheworkpiecethatarenotco..

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  • Reactive ion etching machine

    Reactive ion etching machine

    Reactiveionetching(RIE)isakindofdryetchingequipment,whichusesradiofrequencydischargetoionizereactiongastoproduceactiveions,andusesactiveionstocombinewithworkpi..

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  • Inductively coupled plasma etcher

    Inductively coupled plasma etcher

    Plasmaetching(ICP)referstotheuseofgasthatcanreactwiththeetchedmaterial,throughglowdischargetoformalow-temperatureplasma,tocorrosiontheunshieldedpartofthesample..

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  • Ion beam etching machine

    Ion beam etching machine

    Ionbeametchingisbasedonthesputteringprinciple,usingtheionbeamfromtheionsourcetodirectlybombardtheworkpiece,sputteringoutsomematerialsontheworkpiecethatarenotco..

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