CETC Silicon Carbide (SiC) Process Equipment
CETC Silicon Carbide (SiC) Process Equipment
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Laser welding machine
Thelaserweldingmachineusesthehigh-energylaserbeamtoheatthematerialinasmallarea.Theenergyradiatedbythelaserbeamdiffusesthroughtheheattransfertoguidetheinternald..
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Chain sintering furnace
Chainsinteringfurnaceisakindofcontinuoussinteringfurnacewithcontrollablemultitemperaturezone,whichcanbeusedforCOfiringandpostfiringoflow-temperatureceramicmate..
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Hot press sintering furnace
ThelowtemperaturehotpressingsinteringfurnaceisusedfordischargingglueandsinteringofLTCCsubstrate.TheshrinkageofLTCCsubstrateiscontrolledbypressureassistedsinter..
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Box type sintering furnace
Theboxtypesinteringfurnaceisakindofcontrolledatmosphereliftingtypebatchfurnace.Itcanbeusedfortheprocessingoflaminatingandhotcutting(LTCClowtemperaturecoShaocer..
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Vertical high temperature sintering furnace
Theverticaltungstenmeshsinteringfurnaceisahigh-temperaturesinteringequipmentforthemanufactureofHTCC,AlNandotherhigh-performanceceramicsubstrates,anditcanalsobe..
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Rotary ion beam etching machine
Ionbeametchingisbasedonthesputteringprinciple,usingtheionbeamfromtheionsourcetodirectlybombardtheworkpiece,sputteringoutsomematerialsontheworkpiecethatarenotco..
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Scanning ion beam etching machine
Ionbeametchingisbasedonthesputteringprinciple,usingtheionbeamfromtheionsourcetodirectlybombardtheworkpiece,sputteringoutsomematerialsontheworkpiecethatarenotco..
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Reactive ion etching machine
Reactiveionetching(RIE)isakindofdryetchingequipment,whichusesradiofrequencydischargetoionizereactiongastoproduceactiveions,andusesactiveionstocombinewithworkpi..
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Inductively coupled plasma etcher
Plasmaetching(ICP)referstotheuseofgasthatcanreactwiththeetchedmaterial,throughglowdischargetoformalow-temperatureplasma,tocorrosiontheunshieldedpartofthesample..
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Ion beam etching machine
Ionbeametchingisbasedonthesputteringprinciple,usingtheionbeamfromtheionsourcetodirectlybombardtheworkpiece,sputteringoutsomematerialsontheworkpiecethatarenotco..
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