Address: Changsha City, Hunan Province, paving the new road No. 1025 zip code: 410111
Copyright: The 48th research institute of china electronics technology group corporation
Serial number: ICP 17000560 Hunan Public Security No. 43010302000342
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1964/Year
CETC48 was founded
1978/Year
LC-1 ion implanter, won the National Science Conference Award
1976/Year
GK series diffusion furnace mass supply market
1980/Year
LC series ion implanter was awarded the first prize of scientific and technological achievements of Fourth Mechanical Department
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1982/Year
Developed Ion beam etching machine
1984/Year
WW-1 microcomputer controlled liquid phase epitaxial furnace, LK-2 ion beam etching machine, DT-1 type electron beam annealing equipment won the first prize of Progress in Scientific Technology of Electronics Division
1988/Year
LC series ion implanter was awarded the first prize of scientific and technological achievements of Fourth Mechanical Department
1990/Year
Developed WGK-1 automatic diffusion system
1992/Year
Developed 21 meters automatic nitrogen atmosphere protection push board kiln and received the national new product certificate, won Progress in Scientific Technology prize in Mechanical and electrical department
1995/Year
Developed high current ion implanter and won the first prize of Progress in Scientific Technology of Electronics Division; China's first LD-4 type multi ion beam co sputtering coating machine and won the second prize of Progress in Scientific Technology of Electronics Division
1983/Year
Developed domestic practical DB-3 type electron beam exposure machine
1985/Year
FW-1 type molecular beam epitaxy equipment, liquid metal ion source won the first prize of Progress in Scientific Technology of Electronics Division
1989/Year
Developed domestic roller push sintered magnetic material plate kiln
1991/Year
PECVD-425 multi chamber continuous deposition equipment, silicon molecular beam epitaxy equipment and other equipments won major scientific and Technological Achievements Award in Mechanical and electrical department
1994/Year
Developed LED automatic packaging machine and won the second prize of Progress in Scientific Technology of Electronics Division
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1996/Year
Developed Domestic dual function TEOS-CVD system and the first domestic 36 meters nitrogen kiln; won the national CAD demonstration project unit title
1998/Year
Developed domestic diffusion oxidation system 32+12 meter nitrogen kiln for 8 "process line
2000/Year
Developed large capacity bell type sintering furnace used in sintering of high-grade magnetic materials
2002/Year
Full automatic diffusion system, plasma etching machine, mesh belt sintering furnace and other equipment widely applied in domestic solar cell (6 "dimonds) production line
2004/Year
The tube type PECVD used in production line of solar energy industry; bell type sintering furnace, 44 meters automatic nitrogen protection of single and double push plate kiln won the science and technology second prize of CETC; hot wall PECVD is successfully applied to the international advanced level of Wuxi Suntech solar cell production line; new sensor products reached the international advanced level after identification
2006/Year
100nm 8 "large angle ion implantation machine was successfully applied to the international famous SMIC IC production line; new energy efficient nitrogen protection pusher kiln was good in production and sales; plasma etching machine exported to Singapore; high temperature furnace / type III PECVD/ closed tube diffusion furnace successfully developed and mass supply to the market; Beijing 25MW solar cell the production line put into operation
2008/Year
The special sensor is successfully applied for the first time in China's manned space engineering; solar photovoltaic equipment has complete line "turnkey" solution capability; crystal pulling, a complete industrial chain frp, ingot, wafer,solar cell, solar panel and PV application, solar photovoltaic power station was built ; Hunan 1st phase 100MW solar cell production line completed and put into production , 2nd phase 100MW solar cell production line construction completed
2010/Year
1000MW complete crystal silicon solar photovoltaic industry chain completed and put into operation; 5000 tons of new energy storage materials industry chain completed and put into production
1997/Year
Developed 28 meters automatic nitrogen atmosphere protection push board kiln and won the second prize of Progress in Scientific Technology of Electronics Division
1999/Year
Developed the national "863" project key equipment in the field of optoelectronics, the fully automatic GaP liquid phase epitaxy system which received the national key new product certificate, been successfully applied to the LED production line
2001/Year
Self R&D Bell type sintering furnace, full automatic single push board kiln exported to France, Iran and other places
2003/Year
Integrated circuit science and technology research project electron beam exposure machine, large beam ion implanter, LPCVD, four pipe automatic diffusion system through the acceptance, successfully applied to the domestic IC production line
2005/Year
Diffusion / oxidation system successfully entered the Hongkong market; GaN based MOCVD equipment R & D was success; the second generation of solar special diffusion furnace, plasma etching machine, PECVD, drying / sintering furnace mass supply to the market
2007/Year
Hunan 50MW solar cell production line completed; single crystal furnace, casting furnace for silicon material processing successfully developed and mass market
2009/Year
Nano 90-65 12 "large angle beam ion implantation machine supply to the market; screen printing / detection sorting equipment successfully developed and marketed
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