• 1964/Year

    CETC48 was founded

    1978/Year

    LC-1 ion implanter, won the National Science Conference Award

    1976/Year

    GK series diffusion furnace mass supply market

    1980/Year

    LC series ion implanter was awarded the first prize of scientific and technological achievements of Fourth Mechanical Department

  • 1982/Year

    Developed Ion beam etching machine

    1984/Year

    WW-1 microcomputer controlled liquid phase epitaxial furnace, LK-2 ion beam etching machine, DT-1 type electron beam annealing equipment won the first prize of  Progress in Scientific Technology of Electronics Division

    1988/Year

    LC series ion implanter was awarded the first prize of scientific and technological achievements of Fourth Mechanical Department

    1990/Year

    Developed WGK-1 automatic diffusion system

    1992/Year

    Developed 21 meters automatic nitrogen atmosphere protection push board kiln and received the national new product certificate, won  Progress in Scientific Technology prize in Mechanical and electrical department

    1995/Year

    Developed high current ion implanter and won the first prize of Progress in Scientific Technology of Electronics Division; China's first LD-4 type multi ion beam co sputtering coating machine and won the second prize of Progress in Scientific Technology of Electronics Division

    1983/Year

    Developed domestic practical DB-3 type electron beam exposure machine

    1985/Year

    FW-1 type molecular beam epitaxy equipment, liquid metal ion source won the first prize of  Progress in Scientific Technology of Electronics Division

    1989/Year

    Developed domestic roller push  sintered magnetic material plate kiln

    1991/Year

    PECVD-425 multi chamber continuous deposition equipment, silicon molecular beam epitaxy equipment and other equipments won major scientific and Technological Achievements Award in Mechanical and electrical department

    1994/Year

    Developed LED automatic packaging machine and won the second prize of  Progress in Scientific Technology of Electronics Division

  • 1996/Year

    Developed Domestic dual function TEOS-CVD system and the first domestic 36 meters nitrogen kiln; won the national CAD demonstration project unit title

    1998/Year

    Developed domestic diffusion oxidation system 32+12 meter nitrogen kiln for 8 "process line

    2000/Year

    Developed large capacity bell type sintering furnace used in sintering of high-grade magnetic materials

    2002/Year

    Full automatic diffusion system, plasma etching machine, mesh belt sintering furnace and other equipment widely applied in domestic solar cell (6 "dimonds) production line

    2004/Year

    The tube type PECVD used in production line of solar energy industry; bell type sintering furnace, 44 meters automatic nitrogen protection of single and double push plate kiln won the science and technology second prize of CETC; hot wall PECVD is successfully applied to the international advanced level of Wuxi Suntech solar cell production line; new sensor products reached the international advanced level after identification

    2006/Year

    100nm 8 "large angle ion implantation machine was successfully applied to the international famous SMIC IC production line; new energy efficient nitrogen protection pusher kiln was good in production and sales; plasma etching machine exported to Singapore; high temperature furnace / type III PECVD/ closed tube diffusion furnace successfully developed and mass supply to the market; Beijing 25MW solar cell the production line put into operation

    2008/Year

    The special sensor is successfully applied for the first time in China's manned space engineering; solar photovoltaic equipment has complete line "turnkey" solution capability; crystal pulling, a complete industrial chain frp, ingot, wafer,solar cell, solar panel and PV application, solar photovoltaic power station was built ; Hunan 1st phase 100MW solar cell production line completed and put into production , 2nd phase 100MW solar cell production line construction completed

    2010/Year

    1000MW complete crystal silicon solar photovoltaic industry chain completed and put into operation; 5000 tons of new energy storage materials industry chain completed and put into production

    1997/Year

    Developed 28 meters automatic nitrogen atmosphere protection push board kiln and won the second prize of Progress in Scientific Technology of Electronics Division

    1999/Year

    Developed the national "863" project key equipment in the field of optoelectronics, the fully automatic GaP liquid phase epitaxy system which received the national key new product certificate, been successfully applied to the LED production line

    2001/Year

    Self R&D Bell type sintering furnace, full automatic single push board kiln exported to France, Iran and other places

    2003/Year

    Integrated circuit science and technology research project electron beam exposure machine, large beam ion implanter, LPCVD, four pipe automatic diffusion system through the acceptance, successfully applied to the domestic IC production line

    2005/Year

    Diffusion / oxidation system successfully entered the Hongkong market; GaN based MOCVD equipment R & D was success; the second generation of solar special diffusion furnace, plasma etching machine, PECVD, drying / sintering furnace mass supply to the market

    2007/Year

    Hunan 50MW solar cell production line completed; single crystal furnace, casting furnace for silicon material processing successfully developed and mass market

    2009/Year

    Nano 90-65 12 "large angle beam ion implantation machine supply to the market; screen printing / detection sorting equipment successfully developed and marketed

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