CETC Solar PV Process Equipment
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M82200-9/UM PECVD
- Introduction
- Feature
- Parameters
- Application scope
M82200-9/UM PECVD utilizes direct plasma deposition process to grow high quality anti-reflection coating on the surface of solar cell. It is one of the tube film coating devices with the largest per stack capacity.
- Benefits：
1. 420mm quartz tube to achieve 1800 pcs/h throughput (4 stacks, 308 pcs/stack/run).
2. 300-600°C temperature control range to meet the process requirements of film coating and wafer annealing.
3. N2O (laughing gas) pipeline and operation software reserved for anti-PID process.
4. Excellent film uniformity: within wafer ≤ ± 3%, wafer to wafer ≤ ± 3% and run to run ≤ ± 2%.
5. Full-automatic loading and unloading system, onekey process control and complete alarm and protection function. 
Configuration
Specification
Process Performance
Film uniformity:within wafer ≤±3%, wafer to wafer ≤±3%, run to run ≤±2%
Refractive index uniformity: ≤±0.02
Throughput
308 pcs/stack, ≥1800 pcs/h (4-stack)
Temperature Control
Flat temperature zone: 1370mm
Range: 300 – 600°C
Method: 5-section cascade control with internal and external thermocouples
Precision: ≤±2°C/1250mm
Stability: ≤±2°C/4h (at 450°C)
Pressure Control
Range: 1600mTorr, ±300mTorr adjustable
Ultimate vacuum: ≤1Pa
Air leakage rate: ≤ 1 Pa/min after pump stopped and valve closed
Vacuum recovery speed: AP à 30 mTorr ≤ 2min
Boat Conveyor
Double SiC stainless steel or cantilever bar boat conveyor, with continuously adjustable transfer speed of 0 – 3500mm/min
Positioning precision: ≤±0.5mm
Max load: ≥25kg
Gas Piping System
4 pipelines with MFC control, precision ≤±1%F.S, leakage rate ≤10-7Pa.m3/s
Interlock
Furnace door conditions; air pressure, N2 pressure, water flow pressure and process; special gas valves
System Dimension
10070mmx 1960mm x 3070mm (L x W x H, including vacuum pump)
Power
Peak power: ≤280KVA, heat preservation: ≤ 100KVA (4-stack)
Uptime
≥97%
Control Method
Automatic process control and real-time process parameter and procedure monitoring, with fault diagnosis, alarm and protection functions.
Alarm and Safety
Voice and light indicator for process status; alarm for computer fault and over-temperature; alarm and protection for under-temperature, MFC deviation, reaction chamber pressure deviation and ultimate temperature
Clients
- At present, in the solar cell industry, PECVD devices are used to deposit silicon nitride antireflection coatings.
ADVISORY MESSAGEA
